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Thin Film Deposition & Thermal Treatment

Thin film deposition Furnace


201403_Rens
201403_Kitano
Five Targets Ultra High Vacuume rf Sputtering System
  • 5種類の材料を同時又は交互にスパッタリング堆積可能
  • 2inch target, 3inch substrate


[manual]
Single Target rf Sputtering System (SPF-210HS, Anelva)
  • 4inch target, 3inch substrate


[manual]
Single Target rf Sputtering System (SPF-210?, Anelva)
  • 4inch target, 3inch substrate
Laser Ablation and Three Targets Sputtering System
  • レーザーアブレーション用のレーザー照射窓とターゲットの公転自転機構。
  • 3元スパッタリング


Record book
Vacuum Deposition
[manual]
Vacuum Deposition (SVC-700T, Sanyu Electron)


[manual]
ドライエッチング装置 (L-201D, Avelva)

Contact:
Prof. Minoru FUJII
Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University

Rokkodai, Nada, Kobe 657-8501, Japan

fujii@eedept.kobe-u.ac.jp